摘要
光罩基板
產品介紹
●光罩基板
產品描述：適用于制作光掩模版的基體材料，依據客戶需求，可選用各種材質如：合成石
英、B270i、蘇打玻璃、超白玻璃以及客戶指定的其它材料，通過精密加工
，達到具有高平坦、高平行、高光學透射、材料表面和內部沒有缺陷等特性，廣泛應用于
IC（集成電路）、FPD（平板顯示器）、PCB（印刷電路板）、MEMS（微機電系統）等領域。
Product description: Photomask transparent substrate is the base material for making photomask.
The material can be synthetic quartz,schott B270i,soda lime, ultra clear glass or other optical glass according to customer needs.
The surface has high-quality properties such as high flatness, high parallel,high optical transmission，and no defects on the surface or inside of the material after precision finishing .Photomasks are widely used in IC(Integrated Circuit), FPD (Flat Panel Display),PCB (Printed Circuit Board),MEMS (Micro Electro Mechanical Systems) and other fields.
